Keyphrases
Molecular Beam Epitaxy
100%
Chalcogenides
60%
Reactor
40%
Reflection High-energy Electron Diffraction
30%
Chalcogenide Thin Films
30%
Gas Injector
20%
In Vacuo
20%
Adapter
20%
Quartz Crystal
20%
Base Pressure
20%
Ionization Gauge
20%
Epitaxial Systems
20%
Sputter Deposition
20%
Spectroscopic Ellipsometer
20%
Temperature Cell
20%
Scanning Tunneling Microscopy
10%
Effusion
10%
Wafer
10%
Electron Beam Evaporator
10%
Ellipsometer
10%
Shadow Mask
10%
Inlet System
10%
State Universities
10%
Uptime
10%
Potential Contamination
10%
Background Gas
10%
Room Temperature
10%
Throw Distance
10%
Dual-temperature
10%
High-energy Electron Diffraction
10%
High Vacuum
10%
High-temperature Cell
10%
Gate Valve
10%
Degree of Control
10%
Sample Storage
10%
Chalcogenide Materials
10%
Pennsylvania
10%
Thin Film Characterization
10%
Angle-resolved
10%
Low Vapor Pressure
10%
Sample Temperature
10%
Plasma Sources
10%
Transition Metal Atoms
10%
Metal-organic Materials
10%
Residual Gas Analyzer
10%
Thermal Load
10%
Form-giving
10%
Growth Characterization
10%
Dissimilar Materials
10%
Growth Kinetics
10%
Effusion Cell
10%
Transfer Line
10%
Flux Sensor
10%
Storage Capacity
10%
Photoelectron Spectroscopy
10%
Metallic Components
10%
Low Temperature
10%
Top Electrode
10%
Tunneling Transport
10%
Refractory Metals
10%
Molecular Forms
10%
Oxide Thin Films
10%
Post-growth
10%
Film Surface
10%
In-situ Monitoring
10%
Gas Analyzer
10%
Temperature Measurement
10%
Electron Beam
10%
Depositional System
10%
Pyrometer
10%
In Situ
10%
Surface Sensitivity
10%
Oxides
10%
Characterization Techniques
10%
Spectral Range
10%
Transport Measurements
10%
Sample Exchange
10%
Engineering
Thin Films
100%
Base Pressure
66%
Quartz Crystal
66%
Energy Electron Diffraction
66%
Deposition System
33%
Torr
33%
Room Temperature
33%
Plasma Source
33%
Photoelectron
33%
Film Surface
33%
Sample Holder
33%
Sample Temperature
33%
Low-Temperature
33%
Gas Pipeline
33%
Shadow Mask
33%
Cell Temperature
33%
Sensitive Surface
33%
Growth Kinetics
33%
Metallic Component
33%
Thin Film Characterization
33%
Scanning Tunneling Microscopy
33%
Evaporator
33%
Spectral Range
33%
Gate Valve
33%
Storage Capacity
33%
Residual Gas Analyzer
33%
Material Science
Chalcogenides
100%
Thin Films
30%
Film
30%
Reflection High-Energy Electron Diffraction
30%
Coupling (Materials Design)
20%
Sputter Deposition
20%
Oxide Compound
20%
Refractory Metal
20%
Emission Spectroscopy
10%
Scanning Tunneling Microscopy
10%
Transition Metal
10%
Electron Diffraction
10%
Thin Film Characterization
10%
Thermal Load
10%