Multi-Module UHV MBE Growth and Characterization System (MBE 2)

    Equipment/facility: Equipment

      Equipments Details


      The 2DCC Multi-Module Molecular Beam Epitaxy (MBE) system features in-situ cryogenic ARPES and STM. Samples can be transferred directly into the characterization tools, without exposing them to atmosphere, allowing the properties of pristine surfaces to be studied. This allows us to quickly characterize their inherent properties and rapidly develop and optimize new 2D materials and heterostructures.

      2” diameter substrates
      Adaptor for smaller 1 cm2 substrates
      Se cracker
      6 pocket e-beam source for transition metals (Al, Mo, Nb, Ta, V, W)
      Effusion cells for Bi, Cr, Fe, Sb, Te
      Ellipsometry for real-time film growth monitoring
      Base pressure of 1 x 10-10 Torr
      In-vacuo cryogenic STM with 4 independent probe tips
      In-vacuo cryogenic ARPES (energy resolution 1.8 meV at 2 eV pass energy
      Monochromator with He 1 (21.2 eV) and He 2 (40.8 eV) excitations

      Current Process Capabilities:
      Topological insulators Bi2Se3, (Bi,Sb)2Te3
      TMDs MoSe2, MoTe2, NbSe2, WSe2, WTe2, etc…
      Various heterostructures


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