Material Science
Thin Films
100%
Film
64%
Oxide Compound
48%
Ferroelectric Material
34%
Permittivity
29%
Barium
23%
Titanate
23%
Strontium
21%
Capacitor
19%
Density
19%
Magnesium Oxide
14%
Barium Titanate
11%
Heterojunction
11%
Thermal Conductivity
11%
Cadmium
11%
Ferroelectricity
11%
Solution (Chemistry)
9%
Grain Size
9%
Carrier Concentration
9%
Epitaxy
9%
Silicon
8%
Piezoelectricity
8%
Nitride Compound
7%
Gallium Nitride
7%
ZnO
7%
Dielectric Property
7%
Carbide
6%
Pulsed Laser Deposition
6%
X-Ray Diffraction
6%
Sapphire
6%
Ferroelectric Thin Films
6%
Aluminum Nitride
6%
Lead Zirconate Titanate
5%
Indium Tin Oxide
5%
Molecular Beam Epitaxy
5%
Oxide Film
5%
Capacitance
5%
Keyphrases
Permittivity
17%
Epitaxial
15%
Barium Strontium Titanate
15%
Dielectric Properties
10%
Thermal Conductivity
10%
Capacitors
9%
Barium Strontium Titanate Film
9%
Room Temperature
8%
Barium Titanate
8%
Cadmium Oxide
7%
Dielectric
7%
Oxide Thin Films
7%
Tunability
7%
Electrical Properties
7%
Grain Size
7%
Microstructure
7%
Low Temperature
6%
Temperature Effect
6%
Film Capacitor
6%
Gallium Nitride
6%
Loss Tangent
6%
Chemical Solution Deposition
6%
Annealing
6%
Remanent Polarization
6%
Copper Foil
6%
Ferroelectric Thin Film
6%
Barium Titanate Thin Film
6%
Pulsed Laser Deposition
6%
Wurtzite
6%
Copper Substrate
5%
Cold Sintering
5%
Plasmonics
5%
Oxides
5%
Densification
5%
Molecular Beam Epitaxy
5%
High-entropy Oxides
5%
Metal-organic Chemical Vapor Deposition (MOCVD)
5%
Engineering
Thin Films
61%
Dielectrics
19%
Titanate
15%
Nitride
11%
Ray Diffraction
8%
Room Temperature
7%
Piezoelectric
6%
Plasmonics
6%
Varactor
5%
Thermal Conductivity
5%
