Material Science
Aluminum Nitride
6%
Barium
23%
Barium Titanate
11%
Cadmium
11%
Capacitance
5%
Capacitor
19%
Carbide
6%
Carrier Concentration
9%
Density
19%
Dielectric Property
7%
Epitaxy
9%
Ferroelectric Material
35%
Ferroelectric Thin Films
6%
Ferroelectricity
13%
Film
65%
Gallium Nitride
7%
Grain Size
9%
Heterojunction
11%
High-entropy Oxides
5%
Indium Tin Oxide
5%
Lead Zirconate Titanate
5%
Magnesium Oxide
15%
Molecular Beam Epitaxy
5%
Nitride Compound
7%
Oxide Compound
48%
Oxide Film
5%
Permittivity
29%
Piezoelectricity
8%
Pulsed Laser Deposition
6%
Sapphire
6%
Silicon
8%
Solution (Chemistry)
9%
Strontium
21%
Thermal Conductivity
11%
Thin Films
100%
Titanate
23%
X-Ray Diffraction
6%
ZnO
8%
Keyphrases
Annealing
6%
Barium Strontium Titanate
15%
Barium Strontium Titanate Film
9%
Barium Titanate
8%
Barium Titanate Thin Film
6%
Cadmium Oxide
7%
Capacitors
9%
Chemical Solution Deposition
6%
Cold Sintering
5%
Copper Foil
6%
Copper Substrate
5%
Densification
5%
Dielectric
8%
Dielectric Properties
10%
Electrical Properties
7%
Epitaxial
15%
Ferroelectric Thin Film
6%
Film Capacitor
6%
Gallium Nitride
6%
Grain Size
7%
High-entropy Oxides
5%
Loss Tangent
6%
Low Temperature
6%
Metal-organic Chemical Vapor Deposition (MOCVD)
5%
Microstructure
7%
Molecular Beam Epitaxy
5%
Oxide Thin Films
7%
Oxides
5%
Permittivity
17%
Plasmonics
5%
Pulsed Laser Deposition
6%
Remanent Polarization
6%
Room Temperature
8%
Temperature Effect
6%
Thermal Conductivity
10%
Tunability
7%
Wurtzite
7%
Engineering
Dielectrics
19%
Nitride
12%
Piezoelectric
6%
Plasmonics
6%
Ray Diffraction
8%
Room Temperature
7%
Thermal Conductivity
5%
Thin Films
61%
Titanate
15%
Varactor
5%
