Keyphrases
Holographic Lithography
100%
Z-scan
88%
Third-order Nonlinear Optical Properties
66%
Third-order Optical Nonlinearity
52%
Triplet
50%
High-throughput
44%
Wafer-scale
44%
Nonlinear Refractive Index
41%
Islanding Protection
33%
Adaptive Current Protection
33%
Plasmonic Crystals
33%
Quadruplets
33%
Plasmon Modes
33%
Composite Film
33%
Adaptive Protection
33%
Recloser
33%
2-complex
33%
Low Voltage Ride-through
33%
Fano Resonance
33%
Refractive Index
33%
Optical Characteristics
33%
Graphene Antidots
33%
Symmetry Breaking
33%
Dipole Mode
33%
Poly(methyl methacrylate)
33%
Second Hyperpolarizability
30%
Sublattice
27%
Transmission Loss
27%
Nanoplasmonics
27%
Nonlinear Absorption
25%
Nanoparticle Arrays
22%
Optical Limiting
19%
Acetone Solution
19%
Two-photon Absorption
19%
Dithiolate
19%
Thione
19%
Nonlinear Absorption Coefficient
19%
Light Beam
16%
Laser Wavelength
16%
Higher-order multipole
16%
Islanding Detection
16%
Electron-hole Pairs Separation
16%
Lateral Electric Field
16%
Interference Pattern
16%
Mode Resonance
16%
Quadrupole Mode
16%
Plasmonic Nanostructures
16%
Electromagnetic Energy
16%
Subwavelength Scale
16%
Laser Beam Power
16%
Engineering
Lithography
66%
Nonlinear Absorption
66%
Plasmonics
66%
Absorption Coefficient
50%
Potential Application
41%
Protection Scheme
33%
Graphene
33%
Localized State
33%
Overcurrent Protection
33%
Position Information
33%
Refractive Index
33%
Band Bending
33%
Simulation Result
33%
Circuit Breaker
33%
Interference Pattern
16%
Laser Wavelength
16%
Smallest Feature
16%
Hole Pair
16%
Quenching
16%
Dye Molecule
16%
Telecommunication
11%
Program Flow
8%
Islanded Mode
8%
Light Beam
6%
Polarization State
6%
Q Factor
6%
Nanomaterial
6%
Dispersion Curve
5%
Image Processing
5%
Error Value
5%
Mass Fraction
5%
Waveguide
5%
Overcurrent
5%
Thin Films
5%
