Keyphrases
Berlin
100%
Material World
100%
Network Science
100%
Heterointerface
100%
Nitrides
75%
Technical University
75%
US Students
50%
Oxides
50%
Structural Features
50%
Chemical Features
50%
Optics
25%
International Experience
25%
International Research Collaboration
25%
North Carolina
25%
Hybrid Thin Films
25%
Hybrid System
25%
New Functionalities
25%
Interface Properties
25%
State Universities
25%
Sabbatical
25%
Interface Coupling
25%
Laboratory Facility
25%
Oxide Systems
25%
Smart Structures
25%
Optical Characterization
25%
International Teams
25%
Leibniz
25%
New Physics
25%
German Research Foundation
25%
Communication Skills
25%
Spatial Resolution
25%
German Students
25%
Semiconductors
25%
Energy Resolution
25%
Technical Capability
25%
Electronic Characteristics
25%
Home Institutions
25%
Metal-organic Chemical Vapor Deposition (MOCVD)
25%
Heterostructure
25%
Molecular Beam Epitaxy
25%
Electrical Polarization
25%
Aberration-corrected Scanning Transmission Electron Microscopy
25%
Growth Form
25%
Germany
25%
Deposition Technology
25%
Synthesis Methods
25%
Electron Microscopy Characterization
25%
Maria
25%
Nitrided Oxide
25%
Thin Film Structure
25%
Nonlinear Dielectric Properties
25%
Technical Area
25%
Reduced Defects
25%
Low Dimension
25%
Property Relations
25%
Defect Concentration
25%
Nitride Semiconductors
25%
Fundamental Science
25%
Surfactant-assisted
25%
Material Quality
25%
Engineering
Nitride
100%
Thin Films
50%
Heterostructures
25%
Surfactant
25%
Material Quality
25%
Intelligent Structures
25%
Dielectrics
25%
Vapor Deposition
25%
Nitride Semiconductor
25%
Polar Material
25%
Growth Mode
25%
Leading Edge
25%
Spatial Resolution
25%
Property Relationship
25%
Optoelectronic Device
25%
Oxide System
25%
Chemical Vapor Deposition
25%
Material Science
Nitride Compound
100%
Oxide Compound
75%
Thin Films
25%
Thin Film Structure
25%
Molecular Beam Epitaxy
25%
Chemical Vapor Deposition
25%
Electronic Property
25%
Heterojunction
25%
Transmission Electron Microscopy
25%
Nitride Semiconductor
25%
Ferroelectric Material
25%
Surface Active Agent
25%
Interface Property
25%