A comparison of cl2and hbr/cl2-based polysilicon etch chemistries: Impact on sio2and si substrate damage

John F. Rembetski, Y. D. Chan, E. Boden, Tieer Gu, O. O. Awadelkarim, R. A. Ditizio, S. J. Fonash, Xiaoyu Li, C. R. Viswanathan

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Material Science