A comparison of cl2and hbr/cl2-based polysilicon etch chemistries: Impact on sio2and si substrate damage

  • John F. Rembetski
  • , Y. D. Chan
  • , E. Boden
  • , Tieer Gu
  • , O. O. Awadelkarim
  • , R. A. Ditizio
  • , S. J. Fonash
  • , Xiaoyu Li
  • , C. R. Viswanathan

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

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Material Science