A method for the mass production of ICF targets

K. D. Wise; T. N. Jackson; N. A. Masnari; M. G. Robinson; D. E. Solomon; G. H. Wuttke; W. B. Rensel

doi:10.1016/0022-3115(79)90475-6

A method for the mass production of ICF targets

K. D. Wise, T. N. Jackson, N. A. Masnari, M. G. Robinson, D. E. Solomon, G. H. Wuttke, W. B. Rensel

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

Original language	English (US)
Pages (from-to)	103-106
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	85-86
Issue number	PART 1
DOIs	https://doi.org/10.1016/0022-3115(79)90475-6
State	Published - Dec 2 1979

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
General Materials Science
Nuclear Energy and Engineering

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10.1016/0022-3115(79)90475-6

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title = "A method for the mass production of ICF targets",

abstract = "The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.",

author = "Wise, {K. D.} and Jackson, {T. N.} and Masnari, {N. A.} and Robinson, {M. G.} and Solomon, {D. E.} and Wuttke, {G. H.} and Rensel, {W. B.}",

note = "Funding Information: * This work was supported by the United States Department of Energy under Contract ES-77-C-02-4149.",

year = "1979",

month = dec,

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doi = "10.1016/0022-3115(79)90475-6",

language = "English (US)",

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T1 - A method for the mass production of ICF targets

AU - Wise, K. D.

AU - Jackson, T. N.

AU - Masnari, N. A.

AU - Robinson, M. G.

AU - Solomon, D. E.

AU - Wuttke, G. H.

AU - Rensel, W. B.

N1 - Funding Information: * This work was supported by the United States Department of Energy under Contract ES-77-C-02-4149.

PY - 1979/12/2

Y1 - 1979/12/2

N2 - The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

AB - The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

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U2 - 10.1016/0022-3115(79)90475-6

DO - 10.1016/0022-3115(79)90475-6

M3 - Article

AN - SCOPUS:0018681824

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VL - 85-86

SP - 103

EP - 106

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - PART 1

ER -

A method for the mass production of ICF targets

Abstract

All Science Journal Classification (ASJC) codes

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