A method for the mass production of ICF targets

K. D. Wise; T. N. Jackson; N. A. Masnari; M. G. Robinson; D. E. Solomon; G. H. Wuttke; W. B. Rensel

doi:10.1016/0022-3115(79)90475-6

A method for the mass production of ICF targets

K. D. Wise
, T. N. Jackson
, N. A. Masnari
, M. G. Robinson
, D. E. Solomon
, G. H. Wuttke
, W. B. Rensel

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

Original language	English (US)
Pages (from-to)	103-106
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	85-86
Issue number	PART 1
DOIs	https://doi.org/10.1016/0022-3115(79)90475-6
State	Published - Dec 2 1979

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
General Materials Science
Nuclear Energy and Engineering

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10.1016/0022-3115(79)90475-6

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@article{29c3f39e13834380b85fde8e2096019a,

title = "A method for the mass production of ICF targets",

abstract = "The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.",

author = "Wise, \{K. D.\} and Jackson, \{T. N.\} and Masnari, \{N. A.\} and Robinson, \{M. G.\} and Solomon, \{D. E.\} and Wuttke, \{G. H.\} and Rensel, \{W. B.\}",

note = "Funding Information: * This work was supported by the United States Department of Energy under Contract ES-77-C-02-4149.",

year = "1979",

month = dec,

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doi = "10.1016/0022-3115(79)90475-6",

language = "English (US)",

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journal = "Journal of Nuclear Materials",

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publisher = "Elsevier B.V.",

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TY - JOUR

T1 - A method for the mass production of ICF targets

AU - Wise, K. D.

AU - Jackson, T. N.

AU - Masnari, N. A.

AU - Robinson, M. G.

AU - Solomon, D. E.

AU - Wuttke, G. H.

AU - Rensel, W. B.

N1 - Funding Information: * This work was supported by the United States Department of Energy under Contract ES-77-C-02-4149.

PY - 1979/12/2

Y1 - 1979/12/2

N2 - The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

AB - The application of semiconductor process technology to the manufacture of inertial-confinement fusion targets is described. The use of optical and electron-beam lithography together with silicon etching technology allows the reproducible fabrication of a variety of target configurations for research and may provide a means for the high-volume production of low-cost targets for commercial reactor systems.

UR - https://www.scopus.com/pages/publications/0018681824

UR - https://www.scopus.com/pages/publications/0018681824#tab=citedBy

U2 - 10.1016/0022-3115(79)90475-6

DO - 10.1016/0022-3115(79)90475-6

M3 - Article

AN - SCOPUS:0018681824

SN - 0022-3115

VL - 85-86

SP - 103

EP - 106

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - PART 1

ER -

A method for the mass production of ICF targets

Abstract

All Science Journal Classification (ASJC) codes

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