Abstract
Many results on the fatigue properties of a MEMS structure have been reported, among which the typical approaches were based on and developed from the principles of detecting the flaws and their propagations, such as using a fan shape comb - drivers to yield cyclic compression and tension, and then, to observe the flaw propagation in a Si beam structure. This paper aims at describing the fatigue phenomenon by using the gradually variable parameters i. e. , mean E method, and then, proposing a test structure, through measuring capacitance to describe the fatigue property. This capacitance has a close relation to the displacement induced by the force applied on. The mean Young's modulus E is calculated according to the measured capacitance to reflect the fatigue property of the simple MEMS structure. At the end of this article, this method is verified by ANSYS.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2139-2142 |
| Number of pages | 4 |
| Journal | Chinese Journal of Sensors and Actuators |
| Volume | 20 |
| Issue number | 9 |
| State | Published - Sep 2007 |
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Electrical and Electronic Engineering