A study of target heating in low-energy ion-beam processing

S. A. Ringel; X. C. Mu; S. J. Fonash; S. Ashok

doi:10.1116/1.574082

A study of target heating in low-energy ion-beam processing

S. A. Ringel
, X. C. Mu
, S. J. Fonash
, S. Ashok

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Pages (from-to)	2385-2388
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	4
Issue number	5
DOIs	https://doi.org/10.1116/1.574082
State	Published - Sep 1986

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.574082

Cite this

@article{e86ba1a6551e49ff945f1d3724175ef7,

title = "A study of target heating in low-energy ion-beam processing",

author = "Ringel, \{S. A.\} and Mu, \{X. C.\} and Fonash, \{S. J.\} and S. Ashok",

year = "1986",

month = sep,

doi = "10.1116/1.574082",

language = "English (US)",

volume = "4",

pages = "2385--2388",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - A study of target heating in low-energy ion-beam processing

AU - Ringel, S. A.

AU - Mu, X. C.

AU - Fonash, S. J.

AU - Ashok, S.

PY - 1986/9

Y1 - 1986/9

UR - https://www.scopus.com/pages/publications/84915358101

UR - https://www.scopus.com/pages/publications/84915358101#tab=citedBy

U2 - 10.1116/1.574082

DO - 10.1116/1.574082

M3 - Comment/debate

AN - SCOPUS:84915358101

SN - 0734-2101

VL - 4

SP - 2385

EP - 2388

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 5

ER -

A study of target heating in low-energy ion-beam processing

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Cite this