Adsorption and desorption of no from Rh{111} and Rh{331} surfaces

Lisa A. DeLouise, Nicholas Winograd

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The adsorption and desorption chemistry of NO on the clean Rh{111} and Rh{331} single crystal surfaces was followed with SIMS, XPS, and LEED. Results suggest dissociative NO adsorption occurs at step and/or defect sites. At saturation coverage there was ∼ 10 times more dissociated species on the Rh{331} surface at 300 K than on the Rh{111} surface. On both surfaces two molecular states of NOads have been identified as β1, and β2 which possess different chemical reactivity. Under the condition of saturation coverage the β1 and β2 states are populated on the Rh{111} surface in a different proportion than on the Rh{331} surface. Further, their population on both surfaces is coverage and temperature dependent. When the sample is heated to desorb the saturation overlayer formed on the Rh{111} and Rh{331} crystal surfaces, approximately 50% of the overlayer is found to desorb below ≃ 400 K primarily from the β2 state, molecularly as NO(g). Between 300 and 400 K the β1 state dissociates as binding sites necessary to coordinate Nads and Oads are freed by desorption of NO(g).

Original languageEnglish (US)
Pages (from-to)199-213
Number of pages15
JournalSurface Science
Issue number1
StatePublished - Aug 1 1985

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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