ADSORPTION OF ORDERED ZIRCONIUM PHOSPHONATE MULTILAYER FILMS ON SILICON AND GOLD SURFACES.

Haiwon Lee, Larry J. Kepley, Hun Gi Hong, Sohail Akhter, Thomas E. Mallouk

Research output: Contribution to journalArticlepeer-review

336 Scopus citations

Abstract

Multilayer films of zirconium 1,10-decanediylbis(phosphonate) have been prepared on silicon and gold substrates and characterized by ellipsometry, XPS, and electrochemical measurements. The deposition technique requires first covalent attachment or adsorption of a phosphonic acid anchoring agent. The functionalized substrates are exposed alternately to aqueous ZrOCl//2 and 1,10-decanediylbis(phosphonic acid) solutions to yield multilayer films. Ellipsometry shows an increase in film thickness, on Si, of 17 Angstrom/layer, which corresponds to the layer spacing in bulk Zr(O//3PC//1//0H//2//0PO//3). Variable take-off angle X-ray photoelectron spectra from four-layer films have attenuated Si peaks but strong Zr and P peaks when the detector is 70 degree off the surface normal, implying that the films on Si are continuous.

Original languageEnglish (US)
Pages (from-to)2597-2601
Number of pages5
JournalJournal of physical chemistry
Volume92
Issue number9
DOIs
StatePublished - 1988

All Science Journal Classification (ASJC) codes

  • General Engineering
  • Physical and Theoretical Chemistry

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