Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

Hun Gi Hong; Debra D. Sackett; Thomas E. Mallouk

doi:10.1021/cm00015a030

Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

Hun Gi Hong, Debra D. Sackett, Thomas E. Mallouk

Chemistry

Research output: Contribution to journal › Article › peer-review

112 Scopus citations

Abstract

Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl₂ solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

Original language	English (US)
Pages (from-to)	521-527
Number of pages	7
Journal	Chemistry of Materials
Volume	3
Issue number	3
DOIs	https://doi.org/10.1021/cm00015a030
State	Published - May 1 1991

All Science Journal Classification (ASJC) codes

General Chemistry
General Chemical Engineering
Materials Chemistry

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10.1021/cm00015a030

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title = "Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica",

abstract = "Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 {\AA} by X-ray diffraction.",

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T1 - Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

AU - Hong, Hun Gi

AU - Sackett, Debra D.

AU - Mallouk, Thomas E.

PY - 1991/5/1

Y1 - 1991/5/1

N2 - Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

AB - Multilayer films of zirconium 1, 8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 Å by X-ray diffraction.

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Adsorption of Well-Ordered Zirconium Phosphonate Multilayer Films on High Surface Area Silica

Abstract

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