Advances in High Performance RDL Technologies for Enabling IO Density of 500 IOs/mm/layer and 8-μm IO Pitch Using Low-k Dielectrics

Fuhan Liu, Rui Zhang, Bartlet H. Deprospo, Shreya Dwarakanath, Pratik Nimbalkar, Siddharth Ravichandran, David Weyers, Mohanalingam Kathaperumal, Rao R. Tummala, Madhavan Swaminathan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

20 Scopus citations

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