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Advances in High Performance RDL Technologies for Enabling IO Density of 500 IOs/mm/layer and 8-μm IO Pitch Using Low-k Dielectrics

  • Fuhan Liu
  • , Rui Zhang
  • , Bartlet H. Deprospo
  • , Shreya Dwarakanath
  • , Pratik Nimbalkar
  • , Siddharth Ravichandran
  • , David Weyers
  • , Mohanalingam Kathaperumal
  • , Rao R. Tummala
  • , Madhavan Swaminathan

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

23   Link opens in a new tab Scopus citations

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