Aerosol-Assisted Formation of Mesostructured Thin Films

Yunfeng Lu; Byron F. McCaughey; Donghai Wang; J. Eric Hampsey; Nilesh Doke; Zhengzhong Yang; C. Jeffrey Brinker

doi:10.1002/adma.200305331

Aerosol-Assisted Formation of Mesostructured Thin Films

Yunfeng Lu, Byron F. McCaughey, Donghai Wang, J. Eric Hampsey, Nilesh Doke, Zhengzhong Yang, C. Jeffrey Brinker

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

Original language	English (US)
Pages (from-to)	1733-1736
Number of pages	4
Journal	Advanced Materials
Volume	15
Issue number	20
DOIs	https://doi.org/10.1002/adma.200305331
State	Published - Oct 16 2003

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials
Mechanical Engineering

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@article{196df632dcee46b593591d54d954e708,

title = "Aerosol-Assisted Formation of Mesostructured Thin Films",

abstract = "Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.",

author = "Yunfeng Lu and McCaughey, {Byron F.} and Donghai Wang and Hampsey, {J. Eric} and Nilesh Doke and Zhengzhong Yang and Brinker, {C. Jeffrey}",

year = "2003",

month = oct,

day = "16",

doi = "10.1002/adma.200305331",

language = "English (US)",

volume = "15",

pages = "1733--1736",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "20",

}

TY - JOUR

T1 - Aerosol-Assisted Formation of Mesostructured Thin Films

AU - Lu, Yunfeng

AU - McCaughey, Byron F.

AU - Wang, Donghai

AU - Hampsey, J. Eric

AU - Doke, Nilesh

AU - Yang, Zhengzhong

AU - Brinker, C. Jeffrey

PY - 2003/10/16

Y1 - 2003/10/16

N2 - Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

AB - Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

UR - http://www.scopus.com/inward/record.url?scp=0242523831&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0242523831&partnerID=8YFLogxK

U2 - 10.1002/adma.200305331

DO - 10.1002/adma.200305331

M3 - Article

AN - SCOPUS:0242523831

SN - 0935-9648

VL - 15

SP - 1733

EP - 1736

JO - Advanced Materials

JF - Advanced Materials

IS - 20

ER -

Aerosol-Assisted Formation of Mesostructured Thin Films

Abstract

All Science Journal Classification (ASJC) codes

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