Aerosol-Assisted Formation of Mesostructured Thin Films

Yunfeng Lu; Byron F. McCaughey; Donghai Wang; J. Eric Hampsey; Nilesh Doke; Zhengzhong Yang; C. Jeffrey Brinker

doi:10.1002/adma.200305331

Aerosol-Assisted Formation of Mesostructured Thin Films

Yunfeng Lu
, Byron F. McCaughey
, Donghai Wang
, J. Eric Hampsey
, Nilesh Doke
, Zhengzhong Yang
, C. Jeffrey Brinker

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

Original language	English (US)
Pages (from-to)	1733-1736
Number of pages	4
Journal	Advanced Materials
Volume	15
Issue number	20
DOIs	https://doi.org/10.1002/adma.200305331
State	Published - Oct 16 2003

All Science Journal Classification (ASJC) codes

General Materials Science
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.200305331

Cite this

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title = "Aerosol-Assisted Formation of Mesostructured Thin Films",

abstract = "Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.",

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T1 - Aerosol-Assisted Formation of Mesostructured Thin Films

AU - Lu, Yunfeng

AU - McCaughey, Byron F.

AU - Wang, Donghai

AU - Hampsey, J. Eric

AU - Doke, Nilesh

AU - Yang, Zhengzhong

AU - Brinker, C. Jeffrey

PY - 2003/10/16

Y1 - 2003/10/16

N2 - Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

AB - Mesostructured thin films were fabricated using combined aerosol deposition techniques and evaporation-induced self assembly (EISA). The formation mechanism involved solvent EISA of aerosol droplets with subsequent mesostructure reassembly and particle coalescence on a substrate. A higher degree of silica condensation inhibited the reassembly and resulted in the formation of particles or mesostructured thin films with a less ordered mesostructure.

UR - https://www.scopus.com/pages/publications/0242523831

UR - https://www.scopus.com/pages/publications/0242523831#tab=citedBy

U2 - 10.1002/adma.200305331

DO - 10.1002/adma.200305331

M3 - Article

AN - SCOPUS:0242523831

SN - 0935-9648

VL - 15

SP - 1733

EP - 1736

JO - Advanced Materials

JF - Advanced Materials

IS - 20

ER -

Aerosol-Assisted Formation of Mesostructured Thin Films

Abstract

All Science Journal Classification (ASJC) codes

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