Amorphous Carbon Films as Planarization Layers Deposited by Plasma-Enhanced Chemical Vapor Deposition

Keyphrases

• Plasma-enhanced Chemical Vapor Deposition (PECVD) 100%
• Amorphous Carbon Film 100%
• Planarization 100%
• Planarization Layer 100%
• Room Temperature 50%
• Amorphous Carbon 50%
• Deposition Process 50%
• Carbon Film 50%
• Sub-micrometer 50%
• Deposition Rate 50%
• Bilayer Resist 50%
• Wide Trench 50%
• Fast Deposition 50%
• Ion Bombardment Energy 50%

Engineering

• Amorphous Carbon 100%
• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Planarization 100%
• Energy Engineering 25%
• Room Temperature 25%
• Ion Implantation 25%
• Deposition Process 25%
• Deposition Rate 25%

Material Science

• Film 100%
• Amorphous Carbon 100%
• Plasma-Enhanced Chemical Vapor Deposition 100%
• Carbon Films 100%
• Ion Implantation 50%