Amorphous Sr0.8Bi2.2Ta2O9 thin films for mim embedded capacitors

Min gyu Kang, Kwang hwan Cho, Chil hyoung Lee, Chong yun Kang, Seok jin Yoon, Sang sig Kim

Research output: Contribution to journalArticlepeer-review


Sr0.8Bi2.2Ta2O9 (SBT) thin films with thickness a ranging from 77 nm to 107 nm were deposited on Pt/Ti/SiO2/Si substrates by using a pulsed laser deposition method. During the deposition, the process substrate temperature was maintained at 350 °C for embedded capacitor applications. To form the top electrode of the MIM capacitor, we deposited Pt on the thin films by dc sputtering. The dielectric and the electrical properties of the SBT thin films were investigated in order to evaluate the performance for embedded MIM capacitors. A high capacitance density of 7.06 fF/μm2, along with a dissipation factor of 2.68%, was obtained at 1 MHz. The linear and the quadratic voltage coefficients of the capacitance were 590 ppm/V and 196 ppm/V2, respectively. These results demonstrate that the amorphous SBT thin films are good candidate materials for MIM embedded capacitor.

Original languageEnglish (US)
Pages (from-to)1062-1065
Number of pages4
JournalJournal of the Korean Physical Society
Issue number41
StatePublished - Oct 15 2010

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy


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