An effective lithography training module adapting semianalytical calculation approaches

Atilla Ozgur Cakmak, Evrim Colak, Osama O. Awadelkarim

Research output: Contribution to journalArticlepeer-review


A complete, self-sufficient package is prepared to teach the fundamental concepts of lithography. The adapted semianalytical approaches promise to illustratively create an ideal engaging environment for efficiently training next generation lithographers. The presented educational tool, which integrates the well-known modeling methods from the literature, is shown to capture the photolithography process step by step while offering the students a remote, hands-on feeling from introductory to graduate-level work. The importance of optical and chemistry related parameters are discussed with the aim of creating a useful laboratory assessment package for the educators to be easily integrated into their curriculum.

Original languageEnglish (US)
Pages (from-to)868-895
Number of pages28
JournalJournal of the Society for Information Display
Issue number11
StatePublished - Nov 2021

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering


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