Analysis of Si _1-xGe _x:H thin films with graded composition and structure by real time spectroscopic ellipsometry

Keyphrases

• Real Time Spectroscopic Ellipsometry 100%
• Graded Composition 100%
• Graded Structure 100%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• A-Si 50%
• Two-layer 50%
• Photovoltaic Devices 50%
• Nucleate 50%
• Structural Evolution 50%
• Virtual Interface 50%
• Compositional Evolution 50%
• Microcrystalline 50%
• Interface Analysis 50%
• Si-based 50%
• Silicon-germanium 50%

Material Science

• Film 100%
• Thin Films 100%
• Silicon 50%
• Photovoltaics 50%
• Amorphous Material 50%
• Plasma-Enhanced Chemical Vapor Deposition 50%
• Germanium 50%

Chemical Engineering

• Spectroscopic Ellipsometry 100%
• Plasma Enhanced Chemical Vapor Deposition 50%