Annealing of CH3I films on TiO2(110) studied with TPD and UV-induced desorption

Seong Han Kim; Peter C. Stair; Eric Weitz

doi:10.1016/S0039-6028(99)01031-6

Annealing of CH₃I films on TiO₂(110) studied with TPD and UV-induced desorption

Seong Han Kim, Peter C. Stair, Eric Weitz

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8 Scopus citations

Abstract

Annealing of CH₃I films formed on TiO₂(110) at 90 K has been investigated using thermal desorption and photodesorption. At a surface temperature of 90 K, the multilayer film of CH₃I grows stochastically. Thermal desorption and photodesorption studies indicate that annealing a CH₃I film at temperatures of 120-125 K for less than approx. 12 min induces the desorption of weakly bound molecules and produces two CH₃I phases on TiO₂(110): a two-dimensional (2D) monolayer phase and a three-dimensional (3D) multilayer phase. After annealing at approx. 125 K for 12 min, the 3D multilayer phase is completely desorbed and only the 2D monolayer phase is left on the TiO₂(110) surface. This 2D layer has a saturation molecular density greater than that of the 1 ML film deposited at 90 K. When the annealing temperature is increased to above 130 K, the thermal stability of the 2D film increases and the number of the CH₃I molecules left on the TiO₂(110) surface decreases.

Original language	English (US)
Pages (from-to)	177-185
Number of pages	9
Journal	Surface Science
Volume	445
Issue number	2-3
DOIs	https://doi.org/10.1016/S0039-6028(99)01031-6
State	Published - Jan 20 2000

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/S0039-6028(99)01031-6

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@article{1c1576d518624a6d8b92427dc7c66e5a,

title = "Annealing of CH3I films on TiO2(110) studied with TPD and UV-induced desorption",

abstract = "Annealing of CH3I films formed on TiO2(110) at 90 K has been investigated using thermal desorption and photodesorption. At a surface temperature of 90 K, the multilayer film of CH3I grows stochastically. Thermal desorption and photodesorption studies indicate that annealing a CH3I film at temperatures of 120-125 K for less than approx. 12 min induces the desorption of weakly bound molecules and produces two CH3I phases on TiO2(110): a two-dimensional (2D) monolayer phase and a three-dimensional (3D) multilayer phase. After annealing at approx. 125 K for 12 min, the 3D multilayer phase is completely desorbed and only the 2D monolayer phase is left on the TiO2(110) surface. This 2D layer has a saturation molecular density greater than that of the 1 ML film deposited at 90 K. When the annealing temperature is increased to above 130 K, the thermal stability of the 2D film increases and the number of the CH3I molecules left on the TiO2(110) surface decreases.",

author = "Kim, {Seong Han} and Stair, {Peter C.} and Eric Weitz",

note = "Funding Information: The authors gratefully acknowledge support for this work by the National Science Foundation under Grant No. CHE 92-92523.",

year = "2000",

month = jan,

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doi = "10.1016/S0039-6028(99)01031-6",

language = "English (US)",

volume = "445",

pages = "177--185",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "2-3",

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T1 - Annealing of CH3I films on TiO2(110) studied with TPD and UV-induced desorption

AU - Kim, Seong Han

AU - Stair, Peter C.

AU - Weitz, Eric

N1 - Funding Information: The authors gratefully acknowledge support for this work by the National Science Foundation under Grant No. CHE 92-92523.

PY - 2000/1/20

Y1 - 2000/1/20

N2 - Annealing of CH3I films formed on TiO2(110) at 90 K has been investigated using thermal desorption and photodesorption. At a surface temperature of 90 K, the multilayer film of CH3I grows stochastically. Thermal desorption and photodesorption studies indicate that annealing a CH3I film at temperatures of 120-125 K for less than approx. 12 min induces the desorption of weakly bound molecules and produces two CH3I phases on TiO2(110): a two-dimensional (2D) monolayer phase and a three-dimensional (3D) multilayer phase. After annealing at approx. 125 K for 12 min, the 3D multilayer phase is completely desorbed and only the 2D monolayer phase is left on the TiO2(110) surface. This 2D layer has a saturation molecular density greater than that of the 1 ML film deposited at 90 K. When the annealing temperature is increased to above 130 K, the thermal stability of the 2D film increases and the number of the CH3I molecules left on the TiO2(110) surface decreases.

AB - Annealing of CH3I films formed on TiO2(110) at 90 K has been investigated using thermal desorption and photodesorption. At a surface temperature of 90 K, the multilayer film of CH3I grows stochastically. Thermal desorption and photodesorption studies indicate that annealing a CH3I film at temperatures of 120-125 K for less than approx. 12 min induces the desorption of weakly bound molecules and produces two CH3I phases on TiO2(110): a two-dimensional (2D) monolayer phase and a three-dimensional (3D) multilayer phase. After annealing at approx. 125 K for 12 min, the 3D multilayer phase is completely desorbed and only the 2D monolayer phase is left on the TiO2(110) surface. This 2D layer has a saturation molecular density greater than that of the 1 ML film deposited at 90 K. When the annealing temperature is increased to above 130 K, the thermal stability of the 2D film increases and the number of the CH3I molecules left on the TiO2(110) surface decreases.

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U2 - 10.1016/S0039-6028(99)01031-6

DO - 10.1016/S0039-6028(99)01031-6

M3 - Article

AN - SCOPUS:0033893349

SN - 0039-6028

VL - 445

SP - 177

EP - 185

JO - Surface Science

JF - Surface Science

IS - 2-3

ER -

Annealing of CH₃I films on TiO₂(110) studied with TPD and UV-induced desorption

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