Applications of lasers in microelectronics and micromechanics

In the near future the laser source will be used to full effect in microfabrication. The spectral brightness of the excimer laser will probably propel it to a position as the dominant source for lithography. This will be implemented at the ArF 193 nm wavelength, perhaps to dimensions as small as 0.15 μm in a production environment. In addition, a second technology, laser direct writing, will take on important strategic applications for circuit prototyping and postfabrication (final step) processing. The former technology is posed as a simpler, faster, and less expensive alternative to X-ray, electron-beam, or ion beam lithography for fabricating next generation VLSI. The latter would make methods available for real-time interactive circuit design and will become an enabling technology for multichip modules and three-dimensional micromechanics.