Keyphrases
A-Si
100%
Amorphous Silicon Thin Film
25%
Crystallization Kinetics
100%
Deposition Parameters
25%
Film Deposition
25%
Furnace Annealing
75%
Grain Size
25%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
25%
Poly-Si
25%
Pre-annealing
25%
Rapid Thermal Annealing
50%
Solid-phase Crystallization
100%
Surface Treatment
50%
Synergism
25%
Temperature Effect
25%
Temperature Variation
25%
Thermal Budget
50%
Thin-film Transistors
25%
Material Science
Amorphous Silicon
25%
Annealing
100%
Crystallization Kinetics
100%
Dilution
100%
Film
100%
Film Deposition
25%
Grain Size
25%
Thin Films
25%
Thin-Film Transistor
25%
Engineering
Annealing Furnace
50%
Deposition Parameter
25%
Dilution
100%
Rapid Thermal Annealing
50%
Temperature Change
25%
Thin Films
25%
Thin-Film Transistor
25%
Agricultural and Biological Sciences
Grains
100%
Synergism
100%