Keyphrases
MOSFET
100%
Interface Traps
100%
4H-SiC
100%
Dangling Bonds
100%
Silicon Carbide
100%
Silica
50%
Silicon Dangling Bond
25%
Electrically Detected Magnetic Resonance
25%
High Power
12%
Spin-dependent
12%
Simple Theory
12%
Electron Paramagnetic Resonance
12%
Band Gap
12%
Major Contributor
12%
K-band
12%
Poor Quality
12%
High Signal-to-noise
12%
Defect Centers
12%
Interface Problem
12%
Charge Pump
12%
Resonance Measurement
12%
Dangling Bond Defect
12%
Noise Measurement
12%
High Temperature Applications
12%
Trap-state Density
12%
P-channel
12%
Engineering
Metal-Oxide-Semiconductor Field-Effect Transistor
100%
Dangling Bond
100%
Interface Trap
100%
Defects
42%
Energy Gap
14%
K-Band
14%
Measurement Noise
14%
Channel Device
14%
High Temperature Applications
14%
Material Science
Metal-Oxide-Semiconductor Field-Effect Transistor
100%
Silicon Carbide
100%
Silicon
33%
Density
22%
Signal-to-Noise Ratio
11%