Abstract
Controlled growth of organic multilayers from periodic gold dot arrays on SiO2 surfaces has been used to create complex overlayer structures. Nanosphere lithography was first used to produce uniform metal patterns with particle sizes of 40 nm, spaced by gaps of 110 nm. These particles served as the nucleation centers for layer-by-layer growth of organic/metal ion complexes. The resulting structures can either be isolated adsorbed dot structures on a continuous surface or continuous networks of the adsorbed materials with isolated arrays of SiO2 surface dots. Step-by-step multilayer growth from small isolated centers enables us to monitor the process by direct surface imaging techniques.
Original language | English (US) |
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Pages | 182-185 |
Number of pages | 4 |
State | Published - 2006 |
Event | 2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings - Boston, MA, United States Duration: May 7 2006 → May 11 2006 |
Other
Other | 2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings |
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Country/Territory | United States |
City | Boston, MA |
Period | 5/7/06 → 5/11/06 |
All Science Journal Classification (ASJC) codes
- Engineering(all)