Atomic-scale defects generated in the early/intermediate stages of dielectric breakdown in Si/SiO2transistors

Stephen J. Moxim, Fedor V. Sharov, David R. Hughart, Gaddi S. Haase, Colin G. McKay, Patrick M. Lenahan

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Fingerprint

Dive into the research topics of 'Atomic-scale defects generated in the early/intermediate stages of dielectric breakdown in Si/SiO2transistors'. Together they form a unique fingerprint.

Physics & Astronomy