Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability
- Michael J. Mutch
- , Thomas Pomorski
- , Brad C. Bittel
- , Corey J. Cochrane
- , Patrick M. Lenahan
- , Xin Liu
- , Robert J. Nemanich
- , Justin Brockman
- , Marc French
- , Markus Kuhn
- , Benjamin French
- , Sean W. King
Research output: Contribution to journal › Article › peer-review
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