TY - GEN
T1 - Blazed reflection gratings with electron-beam lithography and ion-beam etching
AU - Miles, Drew M.
AU - McEntaffer, Randall L.
AU - Grisé, Fabien
N1 - Funding Information:
This research used resources of the Advanced Light Source, a U.S. DOE Office of Science User Facility under contract no. DE-AC02-05CH11231, and the Nanofabrication Laboratory and the Materials Characterization Laboratory at the Penn State Materials Research Institute. This work was performed in part at the Cornell NanoScale Facility, a member of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (Grant NNCI-2025233). We also thank the staff at the Penn State Nanofabrication Center, in particular Michael Labella, for their assistance and guidance in developing these processes. We also acknowledge financial support from NASA via grant 80NSSC19K0661 and a NASA Space Technology Research Fellowship (grant 80NSSC17K0183).
Publisher Copyright:
© 2022 SPIE. All rights reserved.
PY - 2022
Y1 - 2022
N2 - In modern X-ray-grating development for astronomical applications, electron-beam lithography has emerged as a primary fabrication approach to producing high-performance reflection gratings for both current and future missions. The work presented here leverages years of development in electron-beam lithography for X-ray gratings to produce a grating pattern that is then blazed with ion-beam etching. The directional ion-beam etching reshapes the groove facets to a consistent, triangular profile with a facet angle specified by the grating application. An initial prototype X-ray reflection grating fabricated with a combination of electron-beam lithography and ion-beam etching is presented here, along with diffraction efficiency performance measured across the soft-X-ray bandpass. This first prototype achieves ≈33% absolute diffraction efficiency from 0.2 – 1.2 keV, with an average peak-order efficiency of ≈17%. The fabrication approach, efficiency measurements, and path toward improved performance are presented.
AB - In modern X-ray-grating development for astronomical applications, electron-beam lithography has emerged as a primary fabrication approach to producing high-performance reflection gratings for both current and future missions. The work presented here leverages years of development in electron-beam lithography for X-ray gratings to produce a grating pattern that is then blazed with ion-beam etching. The directional ion-beam etching reshapes the groove facets to a consistent, triangular profile with a facet angle specified by the grating application. An initial prototype X-ray reflection grating fabricated with a combination of electron-beam lithography and ion-beam etching is presented here, along with diffraction efficiency performance measured across the soft-X-ray bandpass. This first prototype achieves ≈33% absolute diffraction efficiency from 0.2 – 1.2 keV, with an average peak-order efficiency of ≈17%. The fabrication approach, efficiency measurements, and path toward improved performance are presented.
UR - https://www.scopus.com/pages/publications/85140482193
UR - https://www.scopus.com/pages/publications/85140482193#tab=citedBy
U2 - 10.1117/12.2637880
DO - 10.1117/12.2637880
M3 - Conference contribution
AN - SCOPUS:85140482193
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Space Telescopes and Instrumentation 2022
A2 - den Herder, Jan-Willem A.
A2 - Nikzad, Shouleh
A2 - Nakazawa, Kazuhiro
PB - SPIE
T2 - Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray
Y2 - 17 July 2022 through 22 July 2022
ER -