Bond insertion, complexation, and penetration pathways of vapor-deposited aluminum atoms with HO- and CH3O-terminated organic monolayers

Gregory L. Fisher, Amy V. Walker, Andrew E. Hooper, Timothy B. Tighe, Kevin B. Bahnck, Hope T. Skriba, Michael D. Reinard, Brendan C. Haynie, Robert L. Opila, Nicholas Winograd, David L. Allara

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