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Breakdown in the metal/high-k gate stack: Identifying the "weak link" in the multilayer dielectric
G. Bersuker, D. Heh, C. Young, H. Park, P. Khanal, L. Larcher, A. Padovani, P. Lenahan, J. Ryan, B. H. Lee, H. Tseng, R. Jammy
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
72
Scopus
citations