TY - JOUR
T1 - Carbon nanotube fiber microelectrodes show a higher resistance to dopamine fouling
AU - Harreither, Wolfgang
AU - Trouillon, Raphaël
AU - Poulin, Philippe
AU - Neri, Wilfrid
AU - Ewing, Andrew G.
AU - Safina, Gulnara
PY - 2013/8/6
Y1 - 2013/8/6
N2 - We have compared the properties and resistance to DA fouling of a carbon nanotube fiber (CNTF) microelectrode to a traditional carbon fiber (CF) microelectrode. These two materials show comparable electrochemical activities for outer-sphere and inner-sphere redox reactions. Although the CNTF might have a higher intrinsic RC constant, thus limiting its high-frequency behavior, the CNTF shows a significantly higher durability than the CF in terms of electrode stability. During constant oxidation of 100 μM DA, the signal measured by the CNTF microelectrode shows a 2-h window over which no decrease in current is observed. Under the same conditions, the current obtained at the CF microelectrode decreases by almost 50%. A model of the fouling process, assuming the formation of growing patches of insulator on the surface, has been compared to the data. This model is found to be in good agreement with our results and indicates a growth rate of the patches in the 0.1-2 nm s-1 range.
AB - We have compared the properties and resistance to DA fouling of a carbon nanotube fiber (CNTF) microelectrode to a traditional carbon fiber (CF) microelectrode. These two materials show comparable electrochemical activities for outer-sphere and inner-sphere redox reactions. Although the CNTF might have a higher intrinsic RC constant, thus limiting its high-frequency behavior, the CNTF shows a significantly higher durability than the CF in terms of electrode stability. During constant oxidation of 100 μM DA, the signal measured by the CNTF microelectrode shows a 2-h window over which no decrease in current is observed. Under the same conditions, the current obtained at the CF microelectrode decreases by almost 50%. A model of the fouling process, assuming the formation of growing patches of insulator on the surface, has been compared to the data. This model is found to be in good agreement with our results and indicates a growth rate of the patches in the 0.1-2 nm s-1 range.
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U2 - 10.1021/ac401399s
DO - 10.1021/ac401399s
M3 - Article
C2 - 23789970
AN - SCOPUS:84881330310
SN - 0003-2700
VL - 85
SP - 7447
EP - 7453
JO - Analytical Chemistry
JF - Analytical Chemistry
IS - 15
ER -