Keyphrases
Gas Source
100%
Cold Wall
100%
Chemical Vapor Deposition Growth
100%
Chalcogens
100%
Precursor Effect
100%
Photoluminescence
40%
Film Growth
40%
Lateral Growth
40%
Tungsten
20%
In Films
20%
Depositional System
20%
Chemical Vapor Deposition
20%
Growth Rate
20%
Hydrogen Sulfide
20%
Stoichiometry
20%
Sapphire
20%
Thermodynamic Calculation
20%
C2H5
20%
Carbon Contamination
20%
C-plane
20%
Film Deposition
20%
Tungsten Disulfide
20%
Film Properties
20%
Tungsten Hexacarbonyl
20%
Metallic Ratio
20%
WS2 Film
20%
Engineering
Cold Wall
100%
Source Gas
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Lateral Growth
100%
Deposition System
50%
Hydrogen Sulfide
50%
Experimental Observation
50%
Thermodynamic Calculation
50%
Material Science
Chemical Vapor Deposition
100%
Tungsten
100%
Film
66%
Photoluminescence
66%
Film Growth
66%
Sapphire
33%
Film Deposition
33%