Changes in the crystal structure of RF-magnetron sputtered BaTiO3 thin films

Kenji Uchino; Nam Yang Lee; Tamaki Toba; Narikazu Usuki; Hideaki Aburatani; Yukio Ito

doi:10.2109/jcersj.100.1091

Changes in the crystal structure of RF-magnetron sputtered BaTiO₃ thin films

Kenji Uchino, Nam Yang Lee, Tamaki Toba, Narikazu Usuki, Hideaki Aburatani, Yukio Ito

Materials Research Institute (MRI)

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

The crystal structure of BaTiO₃ thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO₃ fine particles, 0.12 μm.

Original language	English (US)
Pages (from-to)	1091-1093
Number of pages	3
Journal	Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
Volume	100
Issue number	1165
DOIs	https://doi.org/10.2109/jcersj.100.1091
State	Published - 1992

All Science Journal Classification (ASJC) codes

Ceramics and Composites
General Chemistry
Condensed Matter Physics
Materials Chemistry

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title = "Changes in the crystal structure of RF-magnetron sputtered BaTiO3 thin films",

abstract = "The crystal structure of BaTiO3 thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO3 fine particles, 0.12 μm.",

author = "Kenji Uchino and Lee, {Nam Yang} and Tamaki Toba and Narikazu Usuki and Hideaki Aburatani and Yukio Ito",

year = "1992",

doi = "10.2109/jcersj.100.1091",

language = "English (US)",

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publisher = "Ceramic Society of Japan",

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T1 - Changes in the crystal structure of RF-magnetron sputtered BaTiO3 thin films

AU - Uchino, Kenji

AU - Lee, Nam Yang

AU - Toba, Tamaki

AU - Usuki, Narikazu

AU - Aburatani, Hideaki

AU - Ito, Yukio

PY - 1992

Y1 - 1992

N2 - The crystal structure of BaTiO3 thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO3 fine particles, 0.12 μm.

AB - The crystal structure of BaTiO3 thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO3 fine particles, 0.12 μm.

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JO - Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan

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Changes in the crystal structure of RF-magnetron sputtered BaTiO₃ thin films

Abstract

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