Changes in the crystal structure of RF-magnetron sputtered BaTiO3 thin films

Kenji Uchino, Nam Yang Lee, Tamaki Toba, Narikazu Usuki, Hideaki Aburatani, Yukio Ito

Research output: Contribution to journalArticlepeer-review

14 Scopus citations


The crystal structure of BaTiO3 thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100°C, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO3 fine particles, 0.12 μm.

Original languageEnglish (US)
Pages (from-to)1091-1093
Number of pages3
JournalNippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
Issue number1165
StatePublished - 1992

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • General Chemistry
  • Condensed Matter Physics
  • Materials Chemistry


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