Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian; B. L. Weiss; R. Roy; T. Badzian; W. Drawl; P. Mistry; M. C. Turchan

doi:10.1016/S0925-9635(97)00182-9

Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian, B. L. Weiss, R. Roy, T. Badzian, W. Drawl, P. Mistry, M. C. Turchan

Division of Mathematics & Natural Sciences (Altoona)

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm² at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

Original language	English (US)
Pages (from-to)	64-69
Number of pages	6
Journal	Diamond and Related Materials
Volume	7
Issue number	1
DOIs	https://doi.org/10.1016/S0925-9635(97)00182-9
State	Published - Jan 1998

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
General Chemistry
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

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10.1016/S0925-9635(97)00182-9

Cite this

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title = "Characterization and electron field emission from diamond coatings deposited by multiple laser process",

abstract = "A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.",

author = "A. Badzian and Weiss, \{B. L.\} and R. Roy and T. Badzian and W. Drawl and P. Mistry and Turchan, \{M. C.\}",

note = "Funding Information: This work was supported in part by a QQC research grant and by the Office of Naval Research under Grant N00014-91-J-4023 and under Grants N00014-95-1-0905 and N00014-95-I-1051. with funding from BMDO and by National Science Foundation under Grant No. DMR-9522566.",

year = "1998",

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doi = "10.1016/S0925-9635(97)00182-9",

language = "English (US)",

volume = "7",

pages = "64--69",

journal = "Diamond and Related Materials",

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T1 - Characterization and electron field emission from diamond coatings deposited by multiple laser process

AU - Badzian, A.

AU - Weiss, B. L.

AU - Roy, R.

AU - Badzian, T.

AU - Drawl, W.

AU - Mistry, P.

AU - Turchan, M. C.

N1 - Funding Information: This work was supported in part by a QQC research grant and by the Office of Naval Research under Grant N00014-91-J-4023 and under Grants N00014-95-1-0905 and N00014-95-I-1051. with funding from BMDO and by National Science Foundation under Grant No. DMR-9522566.

PY - 1998/1

Y1 - 1998/1

N2 - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

AB - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

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UR - https://www.scopus.com/inward/citedby.url?scp=0031619339&partnerID=8YFLogxK

U2 - 10.1016/S0925-9635(97)00182-9

DO - 10.1016/S0925-9635(97)00182-9

M3 - Article

AN - SCOPUS:0031619339

SN - 0925-9635

VL - 7

SP - 64

EP - 69

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 1

ER -

Characterization and electron field emission from diamond coatings deposited by multiple laser process

Abstract

All Science Journal Classification (ASJC) codes

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