Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian; B. L. Weiss; R. Roy; T. Badzian; W. Drawl; P. Mistry; M. C. Turchan

doi:10.1016/S0925-9635(97)00182-9

Characterization and electron field emission from diamond coatings deposited by multiple laser process

A. Badzian
, B. L. Weiss
, R. Roy
, T. Badzian
, W. Drawl
, P. Mistry
, M. C. Turchan

Division of Mathematics & Natural Sciences (Altoona)

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm² at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

Original language	English (US)
Pages (from-to)	64-69
Number of pages	6
Journal	Diamond and Related Materials
Volume	7
Issue number	1
DOIs	https://doi.org/10.1016/S0925-9635(97)00182-9
State	Published - Jan 1998

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
General Chemistry
Mechanical Engineering
Materials Chemistry
Electrical and Electronic Engineering

Access to Document

10.1016/S0925-9635(97)00182-9

Cite this

@article{36de7355597849eabd92a3b786d0189c,

title = "Characterization and electron field emission from diamond coatings deposited by multiple laser process",

abstract = "A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.",

author = "A. Badzian and Weiss, \{B. L.\} and R. Roy and T. Badzian and W. Drawl and P. Mistry and Turchan, \{M. C.\}",

note = "Funding Information: This work was supported in part by a QQC research grant and by the Office of Naval Research under Grant N00014-91-J-4023 and under Grants N00014-95-1-0905 and N00014-95-I-1051. with funding from BMDO and by National Science Foundation under Grant No. DMR-9522566.",

year = "1998",

month = jan,

doi = "10.1016/S0925-9635(97)00182-9",

language = "English (US)",

volume = "7",

pages = "64--69",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Characterization and electron field emission from diamond coatings deposited by multiple laser process

AU - Badzian, A.

AU - Weiss, B. L.

AU - Roy, R.

AU - Badzian, T.

AU - Drawl, W.

AU - Mistry, P.

AU - Turchan, M. C.

N1 - Funding Information: This work was supported in part by a QQC research grant and by the Office of Naval Research under Grant N00014-91-J-4023 and under Grants N00014-95-1-0905 and N00014-95-I-1051. with funding from BMDO and by National Science Foundation under Grant No. DMR-9522566.

PY - 1998/1

Y1 - 1998/1

N2 - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

AB - A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system has been demonstrated, with WC/Co substrates. The process is conducted in open air and does not involve hydrogen. Structural characterization of the diamond coatings, which have exceptional adhesion to cutting tool inserts, indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists at the diamond-WC/Co interface. Electron field emission current densities, useful for flat panel displays of 6 mA/cm2 at an applied voltage of 3000 V for a film-anode distance of 20 μm has been measured.

UR - https://www.scopus.com/pages/publications/0031619339

UR - https://www.scopus.com/pages/publications/0031619339#tab=citedBy

U2 - 10.1016/S0925-9635(97)00182-9

DO - 10.1016/S0925-9635(97)00182-9

M3 - Article

AN - SCOPUS:0031619339

SN - 0925-9635

VL - 7

SP - 64

EP - 69

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 1

ER -

Characterization and electron field emission from diamond coatings deposited by multiple laser process

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this