TY - JOUR
T1 - Characterization of Optical Thin Films by Spectroscopic Ellipsometry
AU - Trolier‐McKinstry, Susan
AU - Chindaudom, Pong
AU - Vedam, Kuppuswami
AU - Hiremath, Basavaraj V.
PY - 1995/9
Y1 - 1995/9
N2 - Spectroscopic ellipsometry was used to rapidly and nonde‐ structively characterize ion‐plated SiO2 and Ta2O5 films on glass substrates as a function of temperature. The analysis provided the density (as a function of depth) and optical properties of the films. The SiO2 film had a higher refractive index than is typical for thermally grown SiO2. This was attributed to compaction of the film during the deposition process. Similarly, the ion‐plated Ta2O5 film had the high refractive index characteristic of a high‐density film. The films were not affected strongly by temperature during heating >100°C.
AB - Spectroscopic ellipsometry was used to rapidly and nonde‐ structively characterize ion‐plated SiO2 and Ta2O5 films on glass substrates as a function of temperature. The analysis provided the density (as a function of depth) and optical properties of the films. The SiO2 film had a higher refractive index than is typical for thermally grown SiO2. This was attributed to compaction of the film during the deposition process. Similarly, the ion‐plated Ta2O5 film had the high refractive index characteristic of a high‐density film. The films were not affected strongly by temperature during heating >100°C.
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U2 - 10.1111/j.1151-2916.1995.tb08678.x
DO - 10.1111/j.1151-2916.1995.tb08678.x
M3 - Article
AN - SCOPUS:0029373976
SN - 0002-7820
VL - 78
SP - 2412
EP - 2416
JO - Journal of the American Ceramic Society
JF - Journal of the American Ceramic Society
IS - 9
ER -