Characterization of Optical Thin Films by Spectroscopic Ellipsometry

Susan Trolier‐McKinstry, Pong Chindaudom, Kuppuswami Vedam, Basavaraj V. Hiremath

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


Spectroscopic ellipsometry was used to rapidly and nonde‐ structively characterize ion‐plated SiO2 and Ta2O5 films on glass substrates as a function of temperature. The analysis provided the density (as a function of depth) and optical properties of the films. The SiO2 film had a higher refractive index than is typical for thermally grown SiO2. This was attributed to compaction of the film during the deposition process. Similarly, the ion‐plated Ta2O5 film had the high refractive index characteristic of a high‐density film. The films were not affected strongly by temperature during heating >100°C.

Original languageEnglish (US)
Pages (from-to)2412-2416
Number of pages5
JournalJournal of the American Ceramic Society
Issue number9
StatePublished - Sep 1995

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry


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