CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.

P. A. Lester, R. Singh, D. A. Rice, R. N. Pangborn, S. Ashok, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Materials Research Society Symposia Proceedings
Publisher	Elsevier Science Publ Co
Pages	199-204
Number of pages	6
Volume	5
ISBN (Print)	0444006974
State	Published - 1982

All Science Journal Classification (ASJC) codes

@inproceedings{60f3c54676a54fdf92b3db18f8f49d92,

title = "CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.",

author = "Lester, {P. A.} and R. Singh and Rice, {D. A.} and Pangborn, {R. N.} and S. Ashok and Fonash, {S. J.}",

year = "1982",

language = "English (US)",

isbn = "0444006974",

volume = "5",

pages = "199--204",

booktitle = "Materials Research Society Symposia Proceedings",

publisher = "Elsevier Science Publ Co",

}

TY - GEN

T1 - CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.

AU - Lester, P. A.

AU - Singh, R.

AU - Rice, D. A.

AU - Pangborn, R. N.

AU - Ashok, S.

AU - Fonash, S. J.

PY - 1982

Y1 - 1982

UR - http://www.scopus.com/inward/record.url?scp=0020303124&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0020303124&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0020303124

SN - 0444006974

VL - 5

SP - 199

EP - 204

BT - Materials Research Society Symposia Proceedings

PB - Elsevier Science Publ Co

ER -