CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.

P. A. Lester, R. Singh, D. A. Rice, R. N. Pangborn, S. Ashok, S. J. Fonash

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Materials Research Society Symposia Proceedings
Publisher	Elsevier Science Publ Co
Pages	199-204
Number of pages	6
ISBN (Print)	0444006974
State	Published - 1982

Name	Materials Research Society Symposia Proceedings
Volume	5
ISSN (Print)	0272-9172

All Science Journal Classification (ASJC) codes

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title = "CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.",

author = "Lester, \{P. A.\} and R. Singh and Rice, \{D. A.\} and Pangborn, \{R. N.\} and S. Ashok and Fonash, \{S. J.\}",

year = "1982",

language = "English (US)",

isbn = "0444006974",

series = "Materials Research Society Symposia Proceedings",

publisher = "Elsevier Science Publ Co",

pages = "199--204",

booktitle = "Materials Research Society Symposia Proceedings",

}

TY - GEN

T1 - CHEMICAL AND ION BEAM ETCH STUDIES OF POLYCRYSTALLINE SILICON.

AU - Lester, P. A.

AU - Singh, R.

AU - Rice, D. A.

AU - Pangborn, R. N.

AU - Ashok, S.

AU - Fonash, S. J.

PY - 1982

Y1 - 1982

UR - https://www.scopus.com/pages/publications/0020303124

UR - https://www.scopus.com/inward/citedby.url?scp=0020303124&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0020303124

SN - 0444006974

T3 - Materials Research Society Symposia Proceedings

SP - 199

EP - 204

BT - Materials Research Society Symposia Proceedings

PB - Elsevier Science Publ Co

ER -