Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

S. L. Riedinger; D. W. Snyder; E. I. Ko; P. J. Sides

doi:10.1016/0921-5107(92)90056-F

Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

S. L. Riedinger, D. W. Snyder, E. I. Ko, P. J. Sides

Applied Research Laboratory (ARL)

Research output: Contribution to journal › Letter › peer-review

7 Scopus citations

Abstract

The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

Original language	English (US)
Pages (from-to)	L9-L12
Journal	Materials Science and Engineering B
Volume	15
Issue number	2
DOIs	https://doi.org/10.1016/0921-5107(92)90056-F
State	Published - Nov 1 1992

All Science Journal Classification (ASJC) codes

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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10.1016/0921-5107(92)90056-F

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title = "Chemimechanical polishing of cadmium telluride with bromine-methanol solutions",

abstract = "The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.",

author = "Riedinger, {S. L.} and Snyder, {D. W.} and Ko, {E. I.} and Sides, {P. J.}",

note = "Funding Information: This work was supportedb y the NationaSlc ience Foundatio(nC TS-8908547), the WesPteernnn sylvarfia Ben FranklinT echnologyC enter,I I-VI, Inc., and the RockwellF oundation.",

year = "1992",

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doi = "10.1016/0921-5107(92)90056-F",

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T1 - Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

AU - Riedinger, S. L.

AU - Snyder, D. W.

AU - Ko, E. I.

AU - Sides, P. J.

N1 - Funding Information: This work was supportedb y the NationaSlc ience Foundatio(nC TS-8908547), the WesPteernnn sylvarfia Ben FranklinT echnologyC enter,I I-VI, Inc., and the RockwellF oundation.

PY - 1992/11/1

Y1 - 1992/11/1

N2 - The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

AB - The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

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U2 - 10.1016/0921-5107(92)90056-F

DO - 10.1016/0921-5107(92)90056-F

M3 - Letter

AN - SCOPUS:0026946269

SN - 0921-5107

VL - 15

SP - L9-L12

JO - Materials Science and Engineering B

JF - Materials Science and Engineering B

IS - 2

ER -

Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

Abstract

All Science Journal Classification (ASJC) codes

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