Chemimechanical polishing of cadmium telluride with bromine-methanol solutions

S. L. Riedinger, D. W. Snyder, E. I. Ko, P. J. Sides

Research output: Contribution to journalLetterpeer-review

6 Scopus citations


The etching of CdTe(110) substrates with bromine-methanol was studied in a chemimechanical polishing apparatus at room temperature. Etch rates were quantified and found to vary linearly with the bromine concentration. The best surface morphology was obtained at low bromine concentrations with the substrate in direct contact with the polishing pad.

Original languageEnglish (US)
Pages (from-to)L9-L12
JournalMaterials Science and Engineering B
Issue number2
StatePublished - Nov 1 1992

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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