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Cobalt/copper composite interconnects for line resistance reduction in both fine and wide lines
T. Nogami, R. Patlolla, J. Kelly, B. Briggs, H. Huang, J. Demarest, J. Li, R. Hengstebeck, X. Zhang, G. Lian, B. Peethala, P. Bhosale, J. Maniscalco, H. Shobha, S. Nguyen, P. McLaughlin, T. Standaert, D. Canaperi, D. Edelstein, V. Paruchuri
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
17
Scopus
citations