Compensating substrate-induced bianisotropy in optical metamaterials using ultrathin superstrate coatings

In this work, we propose an efficient approach to compensate for the commonly observed substrate-induced bianisotropy that occurs in onwafer optical metamaterials at normal incidence. First, the consequence of placing a finite thickness substrate underneath a metamaterial is analyzed, indicating that the induced bianisotropy is a near-field effect. The properties of metamaterials sandwiched between an infinitely thick substrate and a finite-thickness superstrate with different permittivity and thickness values are then investigated. It is demonstrated from full-wave simulations that by adding an ultrathin superstrate with a judicious choice of its thickness and permittivity value, the substrate-induced bianisotropy of the system can be suppressed and even eliminated. In addition to the extracted nonlocal effective medium parameters, the induced electric and magnetic dipole moments calculated from the volumetric microscopic fields are also presented, validating that the magnetoelectric coupling compensation is a real physical phenomenon. This study will benefit future optical metamaterial design and implementation strategies as well as the corresponding fabrication and characterization methodologies.