Conformal coating by high pressure chemical deposition for patterned microwires of II-VI semiconductors

Justin R. Sparks, Rongrui He, Noel Healy, Subhasis Chaudhuri, Thomas C. Fitzgibbons, Anna C. Peacock, Pier J.A. Sazio, John V. Badding

Research output: Contribution to journalArticlepeer-review

23 Scopus citations


Deposition techniques that can uniformly and conformally coat deep trenches and very high aspect ratio pores with uniform thickness films are valuable in the synthesis of complex three-dimensionally structured materials. Here it is shown that high pressure chemical vapor deposition can be used to deposit conformal films of II-VI semiconductors such as ZnSe, ZnS, and ZnO into high aspect ratio pores. Microstructured optical fibers serve as tailored templates for the patterning of II-VI semiconductor microwire arrays of these materials with precision and flexibility. In this way, centimeters-long microwires with exterior surfaces that conform well to the nearly atomically smooth silica templates can be fabricated by conformal coating. This process allows for II-VI semiconductors, which cannot be processed into optical fibers with conventional techniques, to be fabricated into step index and microstructured optical fibers.

Original languageEnglish (US)
Pages (from-to)1647-1654
Number of pages8
JournalAdvanced Functional Materials
Issue number13
StatePublished - Apr 5 2013

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • General Chemistry
  • General Materials Science
  • Electrochemistry
  • Biomaterials


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