Controlling silicon crystallization in aluminum-induced crystallization via substrate plasma treatment

Keyphrases

• Plasma Treatment 100%
• Aluminum-induced Crystallization 100%
• Substrate Surface 66%
• Crystallization Kinetics 66%
• Crystallization Behavior 66%
• Crystallization 33%
• X-ray Photoelectron Spectroscopy 33%
• Surface Energy 33%
• Surface Chemistry 33%
• Surface Treatment 33%
• Contact Angle Measurement 33%
• Chlorine 33%
• Reactive Ion Etching 33%
• Glass Substrate 33%
• Small Grain Size 33%
• Polycrystalline Silicon Film 33%
• Fluorine Plasma 33%
• Optical Lithography 33%

Engineering

• Substrate Surface 100%
• Plasma Treatment 100%
• Fused Silica 100%
• Ray Photoelectron Spectroscopy 50%
• Optical Lithography 50%
• Contact Angle Measurement 50%
• Interfacial Energy 50%
• Polysilicon 50%
• Glass Substrate 50%

Material Science

• Aluminum 100%
• Silicon 100%
• Surface (Surface Science) 80%
• Film 40%
• Grain Size 20%
• Silicon Dioxide 20%
• X-Ray Photoelectron Spectroscopy 20%
• Lithography 20%
• Contact Angle 20%
• Surface Energy 20%
• Reactive Ion Etching 20%
• Surface Treatment 20%