@inproceedings{c5261d8d8d374ccaa5dc72d5b0a825c5,
title = "Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists",
abstract = "A correlation between polymer molecular structure and acid catalyzed reaction kinetics is demonstrated by a photoresist copolymer with an acid-labile and a non-reactive monomer. The acid catalyzed deprotection kinetics depend significantly on the composition of the non-reactive comonomer in the polymer chain. The apparent reaction rate constant decreases monotonically with increasing non-reactive comonomer composition. The phenomena are interpreted as the reduction of diffusivity of photoacid in the polymer matrix from a hydrogen-bonding interaction with the polar group in the inert comonomer. In addition, hydrogen-bonding interactions between the photoacid and the reaction product, primarily methacrylic acid, can account for the acid loss or trapping effect observed by various researchers.",
author = "Shuhui Kang and Prabhu, {Vivek M.} and Vogt, {Bryan D.} and Lin, {Eric K.} and Wu, {Wen Li} and Karen Turnquest",
year = "2006",
doi = "10.1117/12.656594",
language = "English (US)",
isbn = "0819461962",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Advances in Resist Technology and Processing XXIII",
note = "Advances in Resist Technology and Processing XXIII ; Conference date: 20-02-2006 Through 22-02-2006",
}