Abstract
A novel MOSFET device structure is proposed that operates on the principle of majority carrier accumulation in the channel. For an n-channel device, the structure consists of a thin n-type layer on a p-type substrate. By appropriate choice of the n-layer thickness and the donor and acceptor concentrations the n-layer can be completely depleted due to the built-in junction potential or if necessary by applying a suitable substrate bias. The dc current-voltage characteristics are calculated using the depletion approximation.
Original language | English (US) |
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Pages (from-to) | 531-540 |
Number of pages | 10 |
Journal | International Journal of Electronics |
Volume | 54 |
Issue number | 4 |
DOIs | |
State | Published - 1983 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering