Abstract
A novel MOSFET device structure is proposed that operates on the principle of majority carrier accumulation in the channel. For an n-channel device, the structure consists of a thin n-type layer on a p-type substrate. By appropriate choice of the n-layer thickness and the donor and acceptor concentrations the n-layer can be completely depleted due to the built-in junction potential or if necessary by applying a suitable substrate bias. The dc current-voltage characteristics are calculated using the depletion approximation.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 531-540 |
| Number of pages | 10 |
| Journal | International Journal of Electronics |
| Volume | 54 |
| Issue number | 4 |
| DOIs | |
| State | Published - 1983 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
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