Defects in Low-κ dielectrics and etch stop layers for use as interlay er dielectrics in ULSI

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Fingerprint

Dive into the research topics of 'Defects in Low-κ dielectrics and etch stop layers for use as interlay er dielectrics in ULSI'. Together they form a unique fingerprint.

Keyphrases

Material Science

Engineering