TY - JOUR
T1 - Degenerately doped ingabias
T2 - Si as a highly conductive and transparent contact material in the infrared range
AU - Zhong, Y.
AU - Dongmo, P. B.
AU - Gong, L.
AU - Law, S.
AU - Chase, B.
AU - Wasserman, D.
AU - Zide, J. M.O.
PY - 2013
Y1 - 2013
N2 - We demonstrate molecular beam epitaxy (MBE) grown degenerately doped InGaBiAs:Si as a new transparent contact material usable from the near-infrared (near-IR) to the mid-infrared (mid-IR). This material system can exhibit high transparency over large portions ofthe 1.3- 12.5 μm wavelength range, with the exact transparency windows determined by the material carrier concentration. As a comparison, the transmittance of the more conventional IR contact material, Indium Tin Oxide (ITO), drops rapidly for wavelengths longer than1.5 μm. The conductivity of InGaBiAs:Si is also much higher than ITO due to its high doping concentration and good mobility. Our transmission spectra are modeled using a transfermatrix formalism, and the resulting modeled IR transmission spectra closely match our experimental results with proper choice of two fitting parameters, the material plasma frequency and the scattering rate.
AB - We demonstrate molecular beam epitaxy (MBE) grown degenerately doped InGaBiAs:Si as a new transparent contact material usable from the near-infrared (near-IR) to the mid-infrared (mid-IR). This material system can exhibit high transparency over large portions ofthe 1.3- 12.5 μm wavelength range, with the exact transparency windows determined by the material carrier concentration. As a comparison, the transmittance of the more conventional IR contact material, Indium Tin Oxide (ITO), drops rapidly for wavelengths longer than1.5 μm. The conductivity of InGaBiAs:Si is also much higher than ITO due to its high doping concentration and good mobility. Our transmission spectra are modeled using a transfermatrix formalism, and the resulting modeled IR transmission spectra closely match our experimental results with proper choice of two fitting parameters, the material plasma frequency and the scattering rate.
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U2 - 10.1364/OME.3.001197
DO - 10.1364/OME.3.001197
M3 - Article
AN - SCOPUS:84884175195
SN - 2159-3930
VL - 3
SP - 1197
EP - 1204
JO - Optical Materials Express
JF - Optical Materials Express
IS - 8
ER -