Desorption - Ionization mass spectrometry using deposited nanostructured silicon films

J. D. Cuiffi; D. J. Hayes; S. J. Fonash; K. N. Brown; A. D. Jones

doi:10.1021/ac001081k

Desorption - Ionization mass spectrometry using deposited nanostructured silicon films

J. D. Cuiffi, D. J. Hayes, S. J. Fonash, K. N. Brown, A. D. Jones

Research output: Contribution to journal › Article › peer-review

89 Scopus citations

Abstract

We present a method for desorption ionization on silicon based on novel column/void-network-deposited silicon thin films. A number of different peptides and proteins in the ≤6000 Daltons range are analyzed by time-of-flight mass spectrometry in this demonstration of our approach. A variety of sample preparation conditions, including the use of chemical additives, surface treatments, and sample purification are used to show the potential of mass analysis using deposited column/void-network silicon films for high throughput proteomic screening.

Original language	English (US)
Pages (from-to)	1292-1295
Number of pages	4
Journal	Analytical Chemistry
Volume	73
Issue number	6
DOIs	https://doi.org/10.1021/ac001081k
State	Published - Mar 15 2001

All Science Journal Classification (ASJC) codes

Analytical Chemistry

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10.1021/ac001081k

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abstract = "We present a method for desorption ionization on silicon based on novel column/void-network-deposited silicon thin films. A number of different peptides and proteins in the ≤6000 Daltons range are analyzed by time-of-flight mass spectrometry in this demonstration of our approach. A variety of sample preparation conditions, including the use of chemical additives, surface treatments, and sample purification are used to show the potential of mass analysis using deposited column/void-network silicon films for high throughput proteomic screening.",

author = "Cuiffi, {J. D.} and Hayes, {D. J.} and Fonash, {S. J.} and Brown, {K. N.} and Jones, {A. D.}",

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AU - Cuiffi, J. D.

AU - Hayes, D. J.

AU - Fonash, S. J.

AU - Brown, K. N.

AU - Jones, A. D.

PY - 2001/3/15

Y1 - 2001/3/15

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AB - We present a method for desorption ionization on silicon based on novel column/void-network-deposited silicon thin films. A number of different peptides and proteins in the ≤6000 Daltons range are analyzed by time-of-flight mass spectrometry in this demonstration of our approach. A variety of sample preparation conditions, including the use of chemical additives, surface treatments, and sample purification are used to show the potential of mass analysis using deposited column/void-network silicon films for high throughput proteomic screening.

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JO - Analytical Chemistry

JF - Analytical Chemistry

IS - 6

ER -

Desorption - Ionization mass spectrometry using deposited nanostructured silicon films

Abstract

All Science Journal Classification (ASJC) codes

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